X-ray mask support and process for preparation thereof

Details X-ray mask support and process for preparation thereof X-ray mask support and process for preparation thereof

1991-04-22

1992-03-31

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

430 5, G21K 500

Patent

active

051014203

ABSTRACT:
An X-ray mask support comprises a support frame and a support film, wherein both of the support frame and the support film have a thermal expansion coefficient of not more than 1.times.10.sup.-5 K.sup.-1 or wherein the thermal expansion coefficient of the support film does not exceed that of the support flame or wherein both the support frame and the support film have a thermal expansion coefficient of not more than 1.times.10.sup.-5 K.sup.-1 and the support film has a surface roughness at least on the mask surface, of not more than 10 nm r.m.s. Basically a process for preparing the X-ray support film comprises the steps of forming a film on a substrate and sintering the film.

REFERENCES:
patent: 3873824 (1975-03-01), Bean et al.
patent: 4599737 (1986-07-01), Kimura et al.
patent: 4604292 (1986-08-01), Evens et al.
patent: 4608326 (1986-08-01), Neubermans et al.
patent: 4780382 (1988-10-01), Stengle et al.
patent: 4855197 (1989-08-01), Zapha et al.
Patent Abstracts of Japan, Kokai No. 57-092830, vol. 6, No. 176, Sep. 10, 1982.
Patent Abstracts of Japan, Kokai No. 59-202530, vol. 8, No. 49, Mar. 6, 1984.
Suzuki et al., "High Flatness Mask for Step and Repeat X-Ray Lithography", J. Vac. Sci. Technol. B4(1), Jan./Feb. 1986, pp. 221 through 225.
Madouri et al., "Non Hydrogenated Materials for X-Ray Masks", Microelectronic Engineering 12/1987, pp. 241 through 245.

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