X-ray mask structure, process for production thereof, apparatus

Details X-ray mask structure, process for production thereof, apparatus X-ray mask structure, process for production thereof, apparatus

1994-11-18

1996-09-03

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, H01L 3900

Patent

active

055531105

ABSTRACT:
An X-ray mask structure for X-ray lithography comprises a pattern, an X-ray transmissive film for holding the pattern, and a frame for supporting the X-ray transmissive film, wherein a light-scattering prevention film is formed on at least a part of the surface of the X-ray transmissive film and/or of the pattern, and the light scattering prevention film may be a flat coating film formed on at least one of the top face and the back face of the X-ray transmissive film and having a refractive index substantially equal to the refractive index of the X-ray transmissive film. A process for producing the X-ray mask structure comprises steps of forming a flat coating film having a refractive index substantially the same as that of the X-ray transmissive film on at least one of the top face and the back face of the X-ray transmissive film, and forming a pattern at least on the top face of the X-ray transmissive film. An X-ray exposure apparatus comprises an X-ray source, and the X-ray mask structure, and conducts transcription of the pattern formed on the x-ray mask structure onto a transcription-receiving member by projecting X-rays through the X-ray mask structure to the transcription receiving member.

REFERENCES:
patent: 4735877 (1988-04-01), Kato et al.
patent: 5178977 (1993-01-01), Yamada et al.
patent: 5291536 (1994-03-01), Itoh et al.
patent: 5375157 (1994-12-01), Maehara

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