X-ray mask structure, preparation thereof and X-ray exposure met

Details X-ray mask structure, preparation thereof and X-ray exposure met X-ray mask structure, preparation thereof and X-ray exposure met

1994-10-27

1998-05-12

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, G21K 500

Patent

active

057517800

ABSTRACT:
An X-ray mask structure comprises an X-ray transmissive film, an X-ray absorptive member held on the X-ray transmissive film and supporting frame for supporting the X-ray transmissive film. The X-ray absorptive member is constituted of crystalline grains having a grain boundary size of 1 .mu.m or larger, or has a density of 90% or more relative to the density of the bulk material.

REFERENCES:
patent: 4515876 (1985-05-01), Yoshihara et al.
patent: 4728591 (1988-03-01), Clark et al.
M. Itoh et al., "The origin of stress in sputter-deposited tungsten films for x-ray masks", Journal of Vacuum Science and Technology B; vol. 9, No. 1, Jan./Feb. 1991, pp. 149-153, New York, US.
Patent Abstracts of Japan, vol. 11, No. 382 (E-564) Dec. 12, 1987 & JP-A-62 147 730 (Mitsubishi Electric Corp.) Jul. 1, 1987.
Patent Abstracts of Japan, vol. 15, No. 213 (E-1073 May 30, 1991 & JP-A-30 60 112 (Nippon Telegraph & Telephone Corp.) Mar. 15, 1991.

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