X-ray mask structure, manufacturing method, X-ray exposure metho

Details X-ray mask structure, manufacturing method, X-ray exposure metho X-ray mask structure, manufacturing method, X-ray exposure metho

1992-10-01

1993-09-21

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, 430 5, H01L 2130

Patent

active

052475573

ABSTRACT:
An X-ray mask structure has an X-ray absorber, an X-ray permeable film and a frame for supporting the X-ray permeable film, wherein the X-ray absorber is made of gold having crystal orientation such that with respect to the peak strength 1 of the (200) surface, the peak strength of the (111) surface is less than 0.5 in an X-ray diffraction test. A method of manufacturing X-ray mask structures includes the step of forming the X-ray absorber, in which after an X-ray absorbing film is formed on the X-ray permeable film, heating and cooling operations are repeated a plurality of times.

REFERENCES:
patent: 5089085 (1992-02-01), Kashida et al.
patent: 5124561 (1992-06-01), Faure et al.
J. Vac. Sci. Technol. B4(1), Jan./Feb. 1986, pp. 221-225, 230-234.
S. Kuniyoshi et al., SPIE vol. 923, Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VII, Mar. 2-4, 1988, pp. 188-196.
J. Vac. Sci. Technol. B7(6) Nov./Dec. 1989, pp. 1680-1683.
Electronics and Communications in Japan 73 (1990) Nov., No. 11, Part II, pp. 60-67.
J. Vac. Sci. Technol. B9(1) Jan./Feb. 1991, pp. 154-161.
Microelectric Engineering, vol. 6, Nos. 1-4, Dec. 1987, pp. 253-258.

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