X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1992-11-12
1995-06-06
Epps, Georgia Y.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 35, 430 5, G21K 500, G11B 1100, H01L 3900
Patent
active
054229219
ABSTRACT:
An X-ray mask structure includes an X-ray absorber having a masking pattern, an X-ray permeable film for supporting the X-ray absorber on a surface of the X-ray permeable film, and a supporting frame for supporting the X-ray permeable film. The X-ray mask structure has a metal oxide film formed on a portion of the surface of the X-ray permeable film having no X-ray absorber thereon. Also disclosed is a method for manufacturing such an X-ray mask structure.
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Canon Kabushiki Kaisha
Chu Kim-Kwok
Epps Georgia Y.
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