X-ray mask structure and a production method thereof, an exposur

Details X-ray mask structure and a production method thereof, an exposur X-ray mask structure and a production method thereof, an exposur

1993-07-15

1994-12-20

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, G03F 100

Patent

active

053751574

ABSTRACT:
The present invention provides an X-ray mask structure a production method thereof, and an exposure method therefor, whereby patterns can be formed faithfully to designed device line widths regardless of the thickness distribution of an X-ray transmissive membrane. The present invention also provides a device exhibiting stable and high performance fabricated by means the X-ray mask structure. In accordance with the present invention, the X-ray mask structure comprises X-ray absorbers, an X-ray transmissive membrane for supporting the X-ray absorbers, and a supporting frame for supporting the X-ray transmissive membrane, wherein the line widths of the X-ray absorbers are compensated corresponding to the thickness distribution of the X-ray transmissive membrane so that the deviation of the line widths of transferred patterns from the desired line widths of the patterns may be cancelled. A method for producing the X-ray mask structure, an exposure method using the X-ray mask structure, and a device fabricated by use of the X-ray mask structure are also disclosed.

REFERENCES:
patent: 5208124 (1993-05-01), Sporon-Fiedler et al.

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