X-ray mask pellicle

Details X-ray mask pellicle X-ray mask pellicle

1996-09-06

1998-08-11

Wong, Don

X-ray or gamma ray systems or devices

Specific application

Lithography

378208, H05K 100

Patent

active

057938369

ABSTRACT:
An X-ray mask pellicle is capable of protecting the X-ray mask from contaminants and the wafer from contact with the X-ray absorber material of the mask. The X-ray mask pellicle is sufficiently thin to allow X-ray exposure at the required mask to wafer gaps yet is sufficiently durable, replaceable, tough and X-ray resistant to be used in X-ray lithography. A thin (organic or inorganic) X-ray mask pellicle to be placed covering the X-ray mask pattern area is fabricated as a thin film and attached to a support ring. A selected area of the pellicle film, tailored to cover the absorber pattern in the X-ray mask, is etched to decrease its thickness to below 2 .mu.m. If the thin film of the pellicle is not itself conductive, a thin conductive film may be coated on both sides. In an alternative embodiment, the separation between the pellicle and the X-ray mask can be achieved by forming the mask with a stepped profile.

REFERENCES:
patent: 4131363 (1978-12-01), Shea et al.
patent: 4198263 (1980-04-01), Matsuda
patent: 4539070 (1985-09-01), Jarocinski et al.
patent: 4606803 (1986-08-01), Luthje et al.
patent: 4608326 (1986-08-01), Neukermans et al.
patent: 4971851 (1990-11-01), Neukermans et al.

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