X-ray mask, method for fabricating the same, and pattern formati

Details X-ray mask, method for fabricating the same, and pattern formati X-ray mask, method for fabricating the same, and pattern formati

1992-06-18

1994-03-01

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, 430 5, G03C 500

Patent

active

052915360

ABSTRACT:
A method for forming an X-ray exposure mask having an X-ray permeable film with a high visible-light transmissivity. The method includes the steps of forming an aluminum oxide anti-reflective film on an x-ray permeable film, placing an x-ray absorber on the anti-reflective film and etching with the x-ray absorber to form x-ray pattern.

REFERENCES:
H. Luthje et al., "X-ray Lithography: Novel Fabrication Process for SiC/W Steppermasks", Nov. 1989, pp. 2343-2347, Japanese Journal of Applied Physics.
Proceeding of the Fifty-first Meeting of the Japan Society of Applied Physics p. 455, 26a-Y-7 (In the Japanese Language).

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