X-ray mask blank, x-ray mask, and pattern transfer method

Details X-ray mask blank, x-ray mask, and pattern transfer method X-ray mask blank, x-ray mask, and pattern transfer method

1997-11-26

2000-10-03

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

061283630

ABSTRACT:
An X-ray mask blank makes it possible to manufacture an X-ray mask which has an extremely low stress, thus providing an extremely high positional accuracy. In the X-ray mask blank, an X-ray transparent film is formed on a substrate, and an X-ray absorber film is formed on the X-ray transparent film. The top and/or the bottom of the X-ray absorber film is provided with a film in which the product of the film stress and the film thickness thereof lies in the range of 0 to .+-.1.times.10.sup.4 dyn/cm.

REFERENCES:
patent: 5005075 (1991-04-01), Kobayashi
T. Shoki et al., SPIE 1924,450, 1993, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing III.

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