X-ray mask and X-ray exposure method using the same

Details X-ray mask and X-ray exposure method using the same X-ray mask and X-ray exposure method using the same

1997-08-27

2000-08-08

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 34, G21K 500

Patent

active

061012378

ABSTRACT:
An X-ray mask includes a holding frame, a membrane held by the holding frame, a pattern formed on a surface of the membrane by an X-ray absorptive material, the surface being disposed opposed to a workpiece to which the pattern is to be transferred when the mask is mounted in an exposure apparatus, a member for reinforcing the holding frame and having a portion placed closer to the workpiece than to the membrane and a pellicle provided at a side where the pattern is formed, the pellicle being attached to the portion of the member so that the pellicle is placed at the workpiece side of the membrane.

REFERENCES:
patent: 5356686 (1994-10-01), Fujioka et al.
patent: 5422921 (1995-06-01), Chiba
patent: 5469489 (1995-11-01), Miyake et al.
patent: 5485495 (1996-01-01), Miyachi et al.
patent: 5553110 (1996-09-01), Sentoku et al.
patent: 5793836 (1998-08-01), Maldonado et al.

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