X-ray mask and method of fabricating the same

Details X-ray mask and method of fabricating the same X-ray mask and method of fabricating the same

1997-10-14

1999-05-18

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F9/00

Patent

active

059050055

ABSTRACT:
An antireflection film formed on a membrane of an X-ray mask has an amorphous structure. A patterned X-ray absorber intercepting transmission of X-rays is formed to be in contact with the front surface of the antireflection film. Thus, an X-ray mask having excellent pattern positional accuracy and a method of fabricating the same are obtained.

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patent: 5553110 (1996-09-01), Sentoku et al.
"Total Evaluation of W-TI Absorber for X-ray Mask" K. Marumoto et al., SPEI(The International Society for Optical Engineering), Feb. 28, 1994, vol., 2194 pp. 221-230.
"A Strategy for High Accurate X-ray Masks", K. Marumoto et al. Digest of Papers XEL 95 p. M6-2-1.
"Fabrication of X-ray Masks for Giga-Bit DRAM by Using a SIC Membrane and W-TI Absorber" K. Marumoto et al. J/Vac Sci Technol, B, vol. 14, No. 6, Nov./Dec. 1996, pp. 4359-4362.
"Stable Low-Stress Tungsten Absorber Technology for Sub-Half-Micro X-ray Lithography". R.R. Kola et al., J. Vac. Sci. Technol B9(6), Nov./Dec. 1991, pp. 3301-3305.
"Formation of Monolithic Masks for 0.25 .mu.m X-ray lithography", G.K. Celler et al. Appln. Phys. Lett. 59(4), Dec. 9, 1991, pp. 3105-3107.

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