X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1997-05-13
1999-02-09
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
430 5, 378210, G21K 500
Patent
active
058704485
ABSTRACT:
The present X-ray mask comprises an X-ray transmitting film, and a mask pattern formed on the X-ray transmitting film, wherein the mask pattern includes a mixture of a high-contrast pattern and a low-contrast pattern against X-rays and wherein the high-contrast pattern is comprised of stacked films the number of which is larger than that of the low-contrast pattern and which are made of different kinds of materials. A fabrication process of this X-ray mask comprises a step of forming a first metal film; a step of forming a second metal film of a different kind of material from the first metal film, thereon; and a step of successively performing a resist application process and an etching process to form a portion where the both first and second metal films are removed, a portion where only the first metal layer is left, and a portion where the both first and second metal layers are left, thereby forming a mask pattern.
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Chiba Keiko
Maehara Hiroshi
Canon Kabushiki Kaisha
Church Craig E.
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