X-ray mask and exposure method employing the same

Details X-ray mask and exposure method employing the same X-ray mask and exposure method employing the same

1989-03-22

1989-12-12

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

430 5, G21K 500

Patent

active

048872830

ABSTRACT:
An X-ray mask includes a membrane formed of a material which transmits X-rays, a mask pattern formed on the surface of the membrane, the mask pattern being made of an X-ray absorbing material, and a supporting frame formed of a material which is mechanically deformed by an external signal. The supporting frame supports the membrane. In an exposure method which employs this X-ray mask, the X-ray mask is first disposed above a substrate in alignment therewith. Subsequently, distortion in the mask pattern is corrected by the application of the external signal to the supporting frame of the mask, and the substrate is then irradiated with X-rays through the mask so as to transfer the mask pattern of the mask to the substrate.

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