X-ray lithography system

Details X-ray lithography system X-ray lithography system

1984-11-08

1987-09-08

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 510

Patent

active

046929347

ABSTRACT:
Disclosed herein is a X-ray lithography system in which X-rays are generated by a laser beam focused upon a target within an evacuated chamber to create a soft X-ray emitting plasma which also emits debris particles. A thin sheet of X-ray transparent gas is provided between the target and a mask used in the lithographic process to displace the particles away from the mask. The sheet of gas may also be used to maintain a pressure differential across an opening in the evacuated chamber through which the X-rays pass towards the target. In addition, the gas sheet may be used to cool the X-ray mask by placing the mask close to the sheet but at a sufficient distance so that the sheet does not interfere with the mask.

REFERENCES:
patent: 3562793 (1967-08-01), McCann et al.
patent: 4121128 (1978-10-01), Roberts
patent: 4184078 (1980-01-01), Nagel et al.
patent: 4304627 (1981-12-01), Lewis
Nagel et al., "Repetitively Pulsed-plasma Soft X-ray Source", Applied Optics, vol. 23, No. 9, 5-1984.

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