X-ray lithography system

Details X-ray lithography system X-ray lithography system

1987-03-18

1988-05-31

Fields, Carolyn E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378119, 378146, G21K 500, G21K 510

Patent

active

047486465

ABSTRACT:
An X-ray lithography system, in which an X-ray beam is separated from synchrotron radiation beams and reflected by a scanning mirror which vertically scans the reflected X-ray beam. The X-ray is irradiated into an exposure chamber via a beryllium window, which is vertically oscillated in such a manner that the beryllium window is shifted up and down in synchronization with the scanning operation of the X-ray beam.

REFERENCES:
patent: 4516254 (1985-05-01), Komeyama et al.
"Application of Synchrotron Radiation to X-ray Lithography" by Spiller et al. JAP, vol. 47, No. 12, 12/1976, pp. 5450-5459.
J. Vac. Sci. Technol. B 1(4), Oct.-Dec. 1983, pp. 1262-1266.

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