X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1984-09-13
1986-10-21
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378119, G21K 500, H01L 21302
Patent
active
046189718
ABSTRACT:
A system is provided for producing plasma pinch X-rays usable in X-ray lithography. Ionized heated plasma is repeatably generated in a first area directly from solid material without exploding the latter. X-rays are generated in a second area by passing high current through the plasma causing radial inward magnetic field pinching. Accurate control and improved intensity performance, and greater flexibility in selection of X-ray emitting materials, are provided by the separation of the plasma generating and the X-ray pinch generating functions. Common electrode structure is provided for plasma generating and for plasma pinching, which common electrode also provides a cylindrical plasma communication passage from the first to the second area, and provides an X-ray emission passage of desired axial orientation.
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Cartz Louis
Jaskolski Stanley V.
Schutten Herman P.
Spellman Gordon B.
Wackman, deceased Peter H.
Church Craig E.
Eaton Corporation
Grigsby T. N.
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