X-Ray lithography system

Details X-Ray lithography system X-Ray lithography system

1984-01-06

1985-09-03

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378205, 414222, 2504911, H01J 3706, B65G 106, A61K 2702

Patent

active

045396957

ABSTRACT:
The present invention is directed to X-ray lithographic systems, which are characterized by a plurality of work stations, a cartridge in which a wafer and mask are mounted, apparatus for moving the cartridge between the stations, apparatus for moving the cartridge within each station to a kinematic mount, and said kinematic mounts in all of the stations being substantially identical.

REFERENCES:
patent: 3743842 (1973-07-01), Smith et al.
patent: 3892973 (1975-07-01), Coquin et al.
patent: 3921788 (1975-11-01), Roberson, Jr. et al.
patent: 4037111 (1977-07-01), Coquin et al.
patent: 4085329 (1978-04-01), McCoy et al.
patent: 4185202 (1980-01-01), Dean et al.
patent: 4187431 (1980-02-01), Hundt
patent: 4215192 (1980-07-01), Buckley
patent: 4238682 (1980-12-01), Vratny
patent: 4301237 (1981-11-01), Burns
patent: 4335313 (1982-01-01), Kreuzer et al.

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