X-ray lithography system

Details X-ray lithography system X-ray lithography system

1988-07-05

1990-02-06

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378122, G21K 500

Patent

active

048993557

ABSTRACT:
An X-ray lithography system comprises an X-ray source which forms a plasma, a band slit located between the X-ray source and a resist film such that a short slit side is parallel with a central axis of a plasma column, the long slit side being tilted with respect to said central plasma column axis.

REFERENCES:
patent: 4771447 (1988-09-01), Saitoh

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