X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1991-10-08
1993-05-25
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 84, 359846, 359867, G21K 500
Patent
active
052146855
ABSTRACT:
A polished aspheric mirror focusses a fan X-ray beam from a point source onto a work piece as a straight image line. The work piece can be efficiently exposed to the X-ray beam by simply tilting the aspheric mirror about a rotational axis, causing the focused image line to sweep across the workpiece. The aspheric mirror is designed to collimate the beam in one direction, e.g., the horizontal direction, and focus the beam in the other direction, e.g., the vertical direction, thereby creating the focused image line at the workpiece. This process is achieved by representing the mirror surface as at least a fourth order Maclaurin series polynomial, and by adjusting the coefficients of such Maclaurin series to create and maintain the desired straight image line. The mirror surface is then polished using computer controlled polishing techniques to realize the designed shape.
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Maxwell Laboratories Inc.
Porta David P.
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