X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1991-08-21
1992-05-05
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378210, G21K 500
Patent
active
051114917
ABSTRACT:
An X-ray lithography mask comprising a X-ray transparent film made from diamond, X-ray absorber patterns deposited on the X-ray transparent film and diamond crosspieces shaped on the diamond X-ray transparent film for reinforcing the diamond X-ray transparent film. Since both the transparent film and the reinforcing crosspieces are made from diamond, no thermal stress is induced by the change of temperature. The mask excels in transmittance for X-ray, flatness and strength.
REFERENCES:
patent: 4436797 (1984-03-01), Brady et al.
patent: 4604292 (1986-08-01), Evans et al.
Fujimori Naoji
Imai Takahiro
Church Craig E.
Sumitomo Electric Industries Ltd.
LandOfFree
X-ray lithography mask and method for producing same does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with X-ray lithography mask and method for producing same, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray lithography mask and method for producing same will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1419063