X-ray lithography mask

Coating processes – Electrical product produced – Integrated circuit – printed circuit – or circuit board

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Details

427 44, 427160, 96 27E, 96 35, B05D 306

Patent

active

040355225

ABSTRACT:
An X-ray mask for variable resist exposure for use with X-ray lithography so that multi-level devices, using a single exposure of X-rays, can be made.

REFERENCES:
patent: 3462762 (1969-08-01), Kaspaul et al.
patent: 3607382 (1971-09-01), Henker
patent: 3743842 (1973-07-01), Smith et al.

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