Apparatus for inspecting defects in a periodic pattern

Communications: electrical – Digital comparator systems

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

350162SF, 356 71, 356237, G01N 2132

Patent

active

043307752

ABSTRACT:
An apparatus for inspecting a defect in a periodic pattern on an object is provided with a laser device for projecting a laser beam toward the object. A mechanism further included in the defect inspecting apparatus rotates the object in a plane orthogonal to an optical path of the laser beam while moving in the same plane. A spatial band-pass filter is located at the backward focal plane of a lens for Fourier-transforming the laser beam including the information of the periodic pattern and a defect, the laser beam coming from the object. The band-pass filter has a spot-like area for blocking the zeroth order diffraction light transmitted through the periodic pattern a peripheral light blocking area for blocking the first and higher order diffracted light beams, and a ring-like light transmission area permitting the light beam component including the information of a defect to pass therethrough, the light transmission area being located between the spot-like area and the peripheral area. A photo-electric converter for picking up the light beam component including the defect information transmitted through the filter is located on an image forming plane where an image of the object is formed by a lens.

REFERENCES:
patent: 3614232 (1971-10-01), Mathisen
patent: 3658420 (1972-04-01), Axelrod
patent: 3783296 (1974-01-01), Blevins
patent: 3790280 (1974-02-01), Heinz et al.
patent: 3972616 (1976-08-01), Minami et al.
patent: 3989387 (1976-11-01), Hategan
patent: 4000949 (1977-01-01), Watkins
patent: 4118107 (1978-10-01), Parrent et al.
patent: 4159164 (1979-06-01), Dammann et al.
patent: 4197011 (1980-04-01), Hudson
Watkins, "Inspection of I.C. Photomasks With Intensity Spatial Filters", Proc. of the IEEE, vol. 57, No. 9, Sep. 1969, pp. 1634-1639.
Will et al., "Filtering of Defects in I.C. With Orientation Independence", Applied Optics, vol. 10, No. 9, Sep. 1971, pp. 2097-2100.
Flamholz et al., "Dimensional Measurement and Defect Detection Using Spatial Filtering", IBM Journal of R. & D., Nov. 1973, pp. 509-518.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Apparatus for inspecting defects in a periodic pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Apparatus for inspecting defects in a periodic pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Apparatus for inspecting defects in a periodic pattern will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-488632

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.