X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1990-06-05
1991-07-09
Fields, Carolyn E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 84, 378 85, G21K 504
Patent
active
050311999
ABSTRACT:
A beamline for X-ray lithography receives a fan of synchrotron radiation with a first mirror which has a concave/concave (toroidal) shape. This mirror collects the fan of X-rays and partially collimates the beam horizontally. The beam is then intercepted by a second refocusing mirror which has a saddle toroidal shape with a major concave radius of curvature and a minor convex radius of curvature. The refocusing mirror acts to collimate the X-rays horizontally and to focus the X-rays vertically. A third flat mirror may be interposed in the beam reflected from the second mirror and can pivot to change the angle of incidence to cause the beam to scan across the image plane. The two toroidal mirrors preferably have approximately a 2 degree grazing angle of incidence of the beam. The two toroidal mirrors act together to provide a very uniform image with a uniform power distribution in the beam. The beamline provides X-rays that are well matched to the mask and photo-resist requirements of X-ray lithography, in that X-rays above and below the desired process window of X-ray energies are substantially attenuated.
REFERENCES:
patent: 4028547 (1977-05-01), Eisenberger
patent: 4181839 (1980-01-01), Hatton et al.
patent: 4242588 (1980-12-01), Silk et al.
patent: 4516254 (1985-05-01), Komeyama et al.
patent: 4679221 (1987-07-01), O'Brien et al.
patent: 4748646 (1988-05-01), Osada et al.
patent: 4803713 (1989-02-01), Fujii
R. J. Rosser, P. M. J. H. Wormell, "Saddle Toroid Arrays: Novel Grazing Incidence for Synchrotron X-ray Lithography": Blackett Laboratory, Imperial College, England, publication date unknown.
Takashi Kaneko, et al., "A Beamline and Its Components for SR Lithography," Japanese Journal of Applied Physics, vol. 28, No. 10, Oct. 1989, pp. 2080-2083.
Cerrina Franco
Cole, III Richard K.
Fields Carolyn E.
Porta David P.
Wisconsin Alumni Research Foundation
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