X-ray lithography beamline imaging system

Details X-ray lithography beamline imaging system X-ray lithography beamline imaging system

1993-06-24

1994-12-06

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 84, 378145, G21K 500

Patent

active

053717740

ABSTRACT:
An X-ray lithography beamline imaging system has a single condenser mirror with an aspherical reflecting surface, with symmetry only about a plane, without axial symmetry. For an X-ray beam emitted along a y axis and diverging along x and z axes, the reflecting surface is asymmetrical about the y axis and has different focusing power in directions along the x and z axes in an imaging plane orthogonal to the y axis and spaced from the mirror along the y axis such that the mirror reflects and focuses the X-ray beam to a point along the y axis in the imaging plane and to a line along the x axis in the imaging plane.

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