X-ray lithography apparatus including a dose detectable mask

Details X-ray lithography apparatus including a dose detectable mask X-ray lithography apparatus including a dose detectable mask

1993-02-24

1994-06-21

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 378 97, 25037007, 2504922, G21K 500

Patent

active

053234405

ABSTRACT:
An X-ray exposure apparatus using radiation light as exposure light, wherein the apparatus includes: a display device; a detecting device for detecting in each exposure the amount of exposure absorbed by a mask during the exposure; a memory for memorizing an accumulated dose of the mask; and a controller for causing the display device to display a dose of the mask, wherein the dose to be displayed corresponds to the sum of the accumulated dose memorized in the memory and the amount of exposure detected by the detecting device. Also a mask structure suitably usable in such an exposure apparatus.

REFERENCES:
patent: 4621371 (1986-11-01), Gotou et al.
patent: 4777641 (1988-10-01), Inagaki et al.
patent: 4785187 (1988-11-01), Kariya et al.
patent: 4804978 (1989-02-01), Tracy
patent: 5050196 (1991-09-01), Kadosawa et al.
patent: 5112724 (1992-05-01), Bradshaw
Johnson, et al., "Radiation Damage Effects in Boron Nitride Mask Membranes Subjected to X-Ray Exposures," J. Vac. Sci. Tech. B5(1), Jan. 1987, pp. 257 through 261.

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