X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1985-07-11
1987-05-12
Fields, Carolyn E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378119, G21K 500
Patent
active
046655417
ABSTRACT:
Submicron x-ray lithography using a single shot of ultraviolet laser energy of one nanosecond (ns) duration and of relatively low energy to produce an x-ray pulse for exposing a resist to obtain a submicron pattern thereon. The incident x-ray flux used is about an order of magnitude smaller than heretofore required to obtain a comparable exposure with similar x-ray resists. A shield which transmits the x-ray pulse, but blocks the plasma material, is thermally coupled to the resist and heats the resist by transfer of the heat from the plasma thereto, upon exposure of the resist by the x-ray pulse.
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Mallozzi et al, "Laser-Produced Plasmas as an Alternative X-Ray Source for Synchrotron Radiation Research and for Microradiography," Advances in X-Ray Analysis, Plenum Press, New York, 1979.
Fields Carolyn E.
Lukacher Martin
The University of Rochester
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