X-ray lighography system using synchrotron radiation

Details X-ray lighography system using synchrotron radiation X-ray lighography system using synchrotron radiation

1987-11-05

1989-02-07

Fields, Carolyn E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 378146, G21K 500, G21K 510

Patent

active

048037133

ABSTRACT:
An X-ray lithography system using synchrotron radiation including X-rays is disclosed. A mirror is provided in a beam line structure between the X-ray source and the X-ray mask in the X-ray lithography apparatus. The mirror is reciprocatingly moved in the same direction as that of the X-rays from the source, or in the normal direction to that of the X-rays.

REFERENCES:
patent: 4516254 (1985-05-01), Komeyama et al.
patent: 4748646 (1988-05-01), Osada et al.

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