X-ray imaging for patterned film measurement

Details X-ray imaging for patterned film measurement X-ray imaging for patterned film measurement

2007-01-23

2007-01-23

Berman, Jack (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

C378S046000, C378S090000, C378S070000, C378S086000, C438S014000

Reexamination Certificate

active

11135974

ABSTRACT:
An x-ray metrology system includes an e-beam generator to cause a test sample to emit x-rays, x-ray optics for focusing the x-rays, and an x-ray imager to generate an image of the test sample from the focused x-rays. Because the x-ray imager provides a direct representation of the x-ray emission characteristics of the test sample, the resolution of a measurement taken using such a sensor is limited only by the resolution of the sensor (and any focusing optics), rather than by the amount of e-beam spread in the thin film. The x-ray imaging can be performed for object planes at the test sample that are not parallel to the test sample, thereby allowing vertical dimension data to be accurately generated by the x-ray imaging system.

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Erko et al: “Spatial Structure Of The Bragg-Fresnel Lens” from Diffraction X-Ray Optics, Institute of Physics Publishing, 1996, pp. 73-82.

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