X-ray generator and exposure apparatus having the same

Details X-ray generator and exposure apparatus having the same X-ray generator and exposure apparatus having the same

2008-04-01

2008-04-01

Yun, Jurie (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C250S492200

Reexamination Certificate

active

07352842

ABSTRACT:
An X-ray generator introducing an X-ray to an illumination optical system includes plural plasma light sources, and a reflector, movably arranged among the plural light sources, for switching light sources and for reflecting the X-ray from one of the plural light sources to the illumination optical system, wherein an angle between a plane determined by an optical axis of the X-ray emitted from the reflector and a line that connects the plural light sources to the reflector, and a polarization plane on which an electric field vector oscillates is between 45° and 135°, the polarization plane maximizing a reflectance to the X-ray of the illumination optical system.

REFERENCES:
patent: 6861656 (2005-03-01), Murakami
patent: 6946669 (2005-09-01), Kleinschmidt
patent: 7148952 (2006-12-01), Eurlings et al.
patent: 2003-282424 (2003-10-01), None
patent: 2004-226244 (2004-08-01), None

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