X-ray exposure system with curved reflecting mirrors

X-ray or gamma ray systems or devices – Specific application – Lithography

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378 84, 378147, 2504921, G03B 700, G01M 1100

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active

052492150

ABSTRACT:
X-ray exposure equipment which can effectively converge a synchrotron radiation, which tends to diverge to a great extent in a horizontal direction, to assure a sufficiently high intensity on a lithographic plane and can irradiate X-rays perpendicularly to a full lateral extent of the lithographic plane over an entire exposure area. The X-ray exposure equipment comprises a point X-ray source and a first reflecting mirror having first and second point focuses and disposed such that the first focal point coincides with the location of the X-ray source so as to focus X-rays to the second focal point. A second reflecting mirror is disposed such that the focus thereof substantially coincides with the second focal point of the first reflecting mirror so as to collimate X-rays received from the first reflecting mirror by way of the focusing property thereof in parallel to a principal optical axis of an optical system for X-rays which includes the first and second reflecting mirrors. The parallel X-rays from the second reflecting mirror are irradiated perpendicularly to a lithographic plane.

REFERENCES:
patent: 5003567 (1991-03-01), Hawryluk et al.
patent: 5027377 (1991-06-01), Thoe
patent: 5031199 (1991-07-01), Cole, III et al.
patent: 5123036 (1992-06-01), Uno et al.
patent: 5127029 (1992-06-01), Suzuki et al.
patent: 5138158 (1992-08-01), Ninomiya et al.
patent: 5142561 (1992-08-01), Doumas
H. Betz, High Resolution Lithography Using Synchrotron Radiation, Nuclear Instruments and Methods in Physics Research, A246, (1986), pp. 658-667, North-Holland.

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