X-ray exposure process for preventing electrostatic attraction o

Details X-ray exposure process for preventing electrostatic attraction o X-ray exposure process for preventing electrostatic attraction o

1990-12-10

1991-09-10

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

050480669

ABSTRACT:
Provided are an X-ray mask support member, an X-ray mask, and an X-ray exposure process using the X-ray mask, that can effectively prevent the phenomenon of electrostatic attraction or contact of X-ray masks by appropriately disposing an X-ray mask support membrane in an exposure apparatus that employs soft X-rays. A high precision alignment can be performed.

REFERENCES:
patent: 3974382 (1976-08-01), Bernacki
patent: 4852133 (1989-07-01), Ikeda et al.

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