X-ray exposure method and apparatus and device manufacturing met

Details X-ray exposure method and apparatus and device manufacturing met X-ray exposure method and apparatus and device manufacturing met

1996-07-11

1997-02-25

Wong, Don

X-ray or gamma ray systems or devices

Specific application

Lithography

378145, G21K 500

Patent

active

056065868

ABSTRACT:
An exposure method using X-rays from a synchrotron radiation source includes determining a relationship between an X-ray intensity distribution and an exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.

REFERENCES:
patent: 5123036 (1992-06-01), Uno et al.
patent: 5285488 (1994-02-01), Watanabe et al.
Laundy, "Electron Beam Measurements on the Daresbury SRS," Rev. Sci. Instrum., vol. 63, No. 1, Jan. 1992, pp. 554 through 556.
Patent Abstracts of Japan, Kokai No. 04-043626, vol. 16, No. 230, May 1992.

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