X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1993-12-17
1994-09-13
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 97, 378204, G21K 500
Patent
active
053475615
ABSTRACT:
X-rays enter an airtight chamber through a beam duct, pass through a transmission window, and expose a wafer and mask disposed outside the airtight chamber. The wafer and mask are held by a wafer chuck and a mask holder, respectively. The mask holder includes a pressure sensor, which detects variations in the atmospheric pressure. An output from the pressure sensor is converted into a change in the intensity of the x-rays by an arithmetic unit, and is transmitted to a control unit, which controls a driving unit of a shutter. By thus controlling the moving speed of the shutter in accordance with variations in the atmospheric pressure, it is possible to prevent variations in the amount of x-ray exposure of the wafer.
REFERENCES:
patent: 5134640 (1992-07-01), Hirokawa et al.
patent: 5170418 (1992-12-01), Ebinuma
patent: 5172403 (1992-12-01), Tanaka
Patent Abstracts of Japan, Kokai No. 61-035450, vol. 10, No. 190, Jul. 1986.
Patent Abstracts of Japan, Kokai No. 02-100311, vol. 14, No. 308, Jul. 1990.
Patent Abstracts of Japan, Kokai No. 03-101216, vol. 15, No. 288, Jul. 1991.
Canon Kabushiki Kaisha
Porta David P.
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