X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1991-09-27
1993-03-16
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378205, 378208, G21K 500
Patent
active
051951134
ABSTRACT:
An X-ray exposure apparatus comprises an X-ray beam generating source and an exposure apparatus body including an alignment optical system. The exposure apparatus body is set independently from the X-ray beam generating source and the exposure apparatus body is located to be swingable wtih respect to the base such as a floor, through the elastic member. Thereafter, the exposure apparatus body is raised by a raising mechanism, for example, comprising a plurality of vertically expandable air cushions, in a floating manner. A height position and an inclination of the exposure apparatus body are adjusted by controlling the raising mechanism individually so that the axis of the X-ray beam generated from the X-ray source substantially coincides with the optical axis as measurement reference of the alignment optical system. The exposure apparatus body is then secured to this adjusted position by means of the securing mechanism comprising adjusting bolts and clamping bolts, for example.
REFERENCES:
patent: 4525852 (1985-06-01), Rosenberg
patent: 4617681 (1986-10-01), LaFiandra et al.
patent: 4803712 (1989-02-01), Kembo et al.
patent: 4979195 (1990-12-01), Tabata et al.
patent: 5073912 (1991-12-01), Kobayashi et al.
Kabushiki Kaisha Toshiba
Porta David P.
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