X-ray exposure apparatus

X-ray or gamma ray systems or devices – Specific application – Lithography

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378205, 2504911, G21K 500

Patent

active

051649748

ABSTRACT:
An X-ray exposure apparatus wherein a member sensitive to X-ray is exposed to a pattern formed on a mask with the X-rays, includes an X-ray source for emitting X-rays, an irradiation chamber for accommodating the mask and the sensitive member and exposing them to the X-rays emitted by the X-ray source within the chamber and a vacuum pump for evacuating the chamber to effect the exposure operation in a vacuum.

REFERENCES:
patent: 3887811 (1975-06-01), Livesay
patent: 3947687 (1976-03-01), Fenstermacher
patent: 3982133 (1976-09-01), Jupa et al.
patent: 4096389 (1978-06-01), Ashe et al.
patent: 4181839 (1980-01-01), Hatton et al.
patent: 4184078 (1980-01-01), Nagel et al.
patent: 4185202 (1980-01-01), Dean et al.
patent: 4238685 (1980-12-01), Tischer
patent: 4242588 (1980-12-01), Silk et al.
patent: 4284887 (1981-08-01), Kusumoto et al.
patent: 4295072 (1981-10-01), Todokoro et al.
patent: 4301237 (1981-11-01), Burns
patent: 4370554 (1983-01-01), Bohlen et al.
patent: 4419585 (1983-12-01), Strauss et al.
patent: 4419763 (1987-12-01), Hawman
patent: 4467210 (1984-08-01), Sugihara et al.
patent: 4475223 (1984-10-01), Taniguchi et al.
patent: 4514857 (1985-04-01), Kimura et al.
patent: 4516253 (1985-05-01), Novak
patent: 4525852 (1985-06-01), Rosenberg
patent: 4539695 (1985-09-01), La Fiandra
patent: 4613981 (1986-09-01), Siddall et al.
patent: 4979195 (1990-12-01), Tabata et al.
patent: 5073918 (1991-12-01), Kamon
Solid State Technology, Aug. 1981, pp. 57-59.
J. Vac. Sci. Technology, Nov./Dec. 1981, pp. 1194-1199.
Maydan, IEEE Trans. Elect. Ddv., vol. 22, No. 7 (1975) 429:33.

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