X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1991-06-12
1992-11-17
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Lithography
378205, 2504911, G21K 500
Patent
active
051649748
ABSTRACT:
An X-ray exposure apparatus wherein a member sensitive to X-ray is exposed to a pattern formed on a mask with the X-rays, includes an X-ray source for emitting X-rays, an irradiation chamber for accommodating the mask and the sensitive member and exposing them to the X-rays emitted by the X-ray source within the chamber and a vacuum pump for evacuating the chamber to effect the exposure operation in a vacuum.
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Gotoh Susumu
Kariya Takao
Kawai Yasuo
Okunuki Masahiko
Canon Kabushiki Kaisha
Porta David P.
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