X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1991-06-18

1992-12-08

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378210, G21K 500

Patent

active

051704188

ABSTRACT:
An X-ray exposure method and apparatus wherein an exposure chamber coupled with a synchrotron radiation device through a beam line receives synchrotron radiation through a window material provided on the beam line to execute an exposure process, a pressure sensor detects pressure in the exposure chamber, a cutoff valve is provided in a portion of the beam line between the window material and the synchrotron radiation device, and a bypass has a communication valve for communicating a portion of the beam line between the window material and the cutoff valve with a portion between the window material and the exposure chamber. In addition, a vacuum evacuating device effects evacuation of a portion of the beam line between the window material and the cutoff vlave, a pump valve is disposed in a conduit, coupling the beam line with the vacuum evacuating device, and a controller responds to a pressure detected by the pressure sensor so that, when the detected pressure represents a steady state lower than a predetermined pressure, the controller operates to open the cutoff valve and the pump valve and to close the communication valve and, when the detected pressure is higher than the predetermined pressure, the controller operates to close the cutoff valve and the pump valve and thereafter to open the communication valve.

REFERENCES:
patent: 5001734 (1991-03-01), Uda et al.

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