X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1990-02-20

1991-01-08

Church, Craig E.

X-ray or gamma ray systems or devices

Beam control

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378 34, 378145, G21K 510

Patent

active

049842595

ABSTRACT:
An X-ray exposure apparatus comprises an X-ray source, a reflecting mirror for deflecting an X-ray beam radiated from the X-ray source to an object, and mechanisms for rotating the reflecting mirror about an axis of rotation apart from a reflecting surface of the reflecting mirror. The reflecting mirror has such a shape that the angle of incidence remains constant relative to the X-ray beam at given angles of rotation.

REFERENCES:
patent: 4514857 (1985-04-01), Kimura et al.
patent: 4625323 (1986-11-01), O'Kaya
patent: 4803713 (1989-02-01), Fujii
"X-Ray Lithography and Applications of Soft X Rays to Technology" Alan Wilson, Proceedings of SPIE, Oct. 1983, vol. 448, pp. 93-101.

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