X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1995-04-04

1997-02-04

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378206, G03F 720

Patent

active

056006985

ABSTRACT:
An exposure apparatus for transferring a pattern of a mask onto a substrate, includes a regulating an member for regulating exposure beam from a light source, and an alignment optical system for projecting an alignment beam to an alignment mark of the mask, to perform alignment between the mask and the substrate. The regulating member is arranged to pass the alignment light therethrough. The distance E from the regulating member to the mask satisfies the relation

REFERENCES:
patent: 5131022 (1992-07-01), Terashima et al.
patent: 5157700 (1992-10-01), Kurosawa et al.
patent: 5161176 (1992-11-01), Ebinuma et al.
patent: 5225892 (1993-07-01), Matsugu et al.
patent: 5299251 (1994-03-01), Kikuiri et al.
patent: 5317615 (1994-05-01), Ebinuma et al.
patent: 5356686 (1994-10-01), Fujioka et al.
patent: 5390227 (1995-02-01), Mizusawa et al.

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