X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1994-02-02

1994-10-04

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, G21K 500

Patent

active

053533232

ABSTRACT:
Disclosed is an X-ray exposure apparatus comprising a chamber, filled with X-ray low attenuation gas for guiding X-rays, generated from an X-ray source, to an X-ray window, a gas supplying portion, provided to supply X-ray low attenuation gas into the chamber and having a portion with a small-diameter passage cross section formed at least at a part thereof, a gas discharging portion, provided to discharge gas from the chamber and having a portion with a small-diameter passage cross section formed at least at a part thereof, and a flow-rate controller for controlling a flow rate of the gas to be supplied to the gas supplying portion to thereby control pressure in the chamber, whereby pressure in the chamber is made equal to or slightly higher than atmospheric pressure by setting the small-diameter portion of the gas supplying portion smaller than that of the gas discharging portion.

REFERENCES:
patent: 5172403 (1992-12-01), Tanaka et al.
patent: 5267292 (1993-11-01), Tanaka et al.
S. Ishihara, et al., J. Vac. Sci. Technol. B 7(6), Nov./Dec. 1989, pp. 1652-1656, "A Vertical Stepper for Synchrotron X-Ray Lithography."

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