X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1993-03-01

1993-11-30

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 2504922, G21K 500

Patent

active

052672921

ABSTRACT:
An X-ray exposure apparatus for exposing a semiconductor wafer to a mask with X-rays, to print a pattern of the mask onto the wafer, is disclosed. The ambience within a stage accommodating chamber, accommodating a mask, a semiconductor wafer, and the like, is replaced by helium. Thereafter, a predetermined quantity of helium is supplied into the stage accommodating chamber. This effectively prevents degradation of the purity of helium due to air leakage into the chamber. Therefore, any undesirable decrease in the quantity of X-ray transmission can be avoided. Thus, high-precision and high-throughput exposure is ensured.

REFERENCES:
patent: 4185202 (1980-01-01), Dean et al.
patent: 4516254 (1985-05-01), Komeyama et al.
patent: 4748646 (1988-05-01), Osada et al.
patent: 4825453 (1989-04-01), Kembo et al.

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