X-ray exposure apparatus

Details X-ray exposure apparatus X-ray exposure apparatus

1998-06-30

2000-06-20

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

2504922, G21K 500

Patent

active

06078640&

ABSTRACT:
An exposure method and apparatus for lithographically transferring a pattern of a mask onto a substrate to be exposed, wherein a detecting system detects a relative positional relation between the mask and the substrate with respect to at least a predetermined direction, a stage member changes the relative positional relation between the mask and the substrate, on the basis of the detection by the detecting system, a magnification correcting mechanism corrects a transfer magnification of the mask pattern to the substrate, a control system for the stage member corrects one of a drive amount of the stage member and a detection result of the detecting system in accordance with a positional deviation of the mask pattern attributable to the correction operation of the magnification correcting mechanism.

REFERENCES:
patent: 5329126 (1994-07-01), Amemiya et al.

Affiliated with

Also associated with

Rating

X-ray exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with X-ray exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1859959