X-Ray exposure apparatus

Details X-Ray exposure apparatus X-Ray exposure apparatus

1991-07-22

1992-06-16

Howell, Janice A.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 84, G21K 500

Patent

active

051230364

ABSTRACT:
An X-ray exposure apparatus for exposing a resist on a substrate to a pattern of an original includes a radiation source for providing X-rays; and an illumination system for irradiating the original and the substrate with the X-rays such that the resist of the substrate is exposed to the pattern of the original with the X-rays; wherein the illumination system has a convex mirror having a reflection surface of a shape like a cylindrical surface, for reflecting the X-rays from the radiation source to the original; and wherein the reflection surface of the mirror has such an aspherical surface shape that, with respect to a top of the reflection surface, a radiation source side and an original side are asymmetrical in shape, that, in the neighborood of the top, the radiation source side has a radius of curvature smaller than that of the original side, and that at a peripheral potion the reflection surface has a curvature of a radius larger than that at the top of the reflection surface.

REFERENCES:
patent: 4028547 (1977-06-01), Eisenberger
patent: 4631743 (1986-12-01), Tominass et al.
patent: 5003567 (1991-03-01), Hawryluk et al.
Grobman, "Synchrotron Radiation X-Ray Lithography," Handbook on Synchrotron Radiation, vol. 1, 1983, pp. 1131 through 1136.

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