X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1998-04-07
2000-05-30
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 81, G01N 23207
Patent
active
060699345
ABSTRACT:
An x-ray diffractometer system comprising an x-ray optic which directs x-rays, a sample placed into said directed x-rays, wherein said sample diffracts said directed x-rays, creating a diffraction pattern, a translation stage coupled to said sample for moving said sample within said directed x-rays, whereby the resolution, angular range, and intensity of said diffraction pattern may be adjusted, and an x-ray detector for registering said diffraction pattern.
REFERENCES:
patent: 3636347 (1972-01-01), Poot
patent: 4364122 (1982-12-01), Wolfel et al.
patent: 4525853 (1985-07-01), Keem et al.
patent: 4958363 (1990-09-01), Nelson et al.
patent: 5027377 (1991-06-01), Thoe
patent: 5127039 (1992-06-01), Hesch
patent: 5353324 (1994-10-01), Kitano
patent: 5359640 (1994-10-01), Fink et al.
patent: 5373544 (1994-12-01), Goebel
patent: 5418828 (1995-05-01), Carpenter
patent: 5459770 (1995-10-01), Salje
patent: 5604782 (1997-02-01), Cash
Jiang Licai
Verman Boris
Dunn Drew A.
Osmic, Inc.
Porta David P.
LandOfFree
X-ray diffractometer with adjustable image distance does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with X-ray diffractometer with adjustable image distance, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and X-ray diffractometer with adjustable image distance will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1916601