X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1993-03-15
1996-02-13
Porta, David P.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
378 49, 378 82, 378 90, G01N 2320
Patent
active
054917387
ABSTRACT:
An x-ray diffraction apparatus for use in analyzing the x-ray diffraction pattern of a sample. The apparatus includes a beam source for generating a collimated x-ray beam having one or more discrete x-ray energies, a holder for holding the sample to be analyzed in the path of the beam, and a charge-coupled device having an array of pixels for detecting, in one or more selected photon energy ranges, x-ray diffraction photons produced by irradiating such a sample with said beam. The CCD is coupled to an output unit which receives input information relating to the energies of photons striking each pixel in the CCD, and constructs the diffraction pattern of photons within a selected energy range striking the CCD.
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Janesick, J. R., et al., "Present and Future CCDs For UV and X-Ray Scientific Measurements," IEEE Trans. NS-32 1(409):1-8 (1985).
Janesick, J. R., et al., "Charge-coupled device advances for x-ray scientific applications in 1986," Optical Engineer. 26(2):156-166 (1987).
Lumb, D. H., "Calibration and X-Ray Spectroscopy with Silicon CCSs," Nucl. Instr. Meth. Phys. Res. A290:559-564 (1990).
Luppino, G. A., et al., "Imaging and Nondispersive spectroscopy of soft x rays using a laboratory x-ray charge-coupled-device system," Optical Engineer. 26(10):1048-1054 (1987).
Blake David F.
Bryson Charles
Freund Friedemann
Mannix John G.
Miller Guy M.
Porta David P.
The United States of America as represented by the Administrator
Warsh Kenneth L.
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