X-ray collimator for lithography

Details X-ray collimator for lithography X-ray collimator for lithography

1998-07-10

2000-04-11

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 34, 378 84, 378147, G21K 106

Patent

active

06049588&

ABSTRACT:
An x-ray collimator for use primarily in x-ray lithography for semiconductor fabrication provides a multi-channel collimator to produce a series of collimated beams from an x-ray source. Each channel in the array gathers photons from a small solid angle of the x-ray source and employs at least two pairs of orthogonal spherical mirrors in grazing incidence to produce a collimated beam. An array of flat mirrors steer the collimated beams into a slightly converging geometry. A beam assembler then combines the beams to create a single, large collimated beam that can be used to expose the die.

REFERENCES:
patent: 4242588 (1980-12-01), Silk et al.
patent: 4429953 (1984-02-01), Zehnpfennig et al.
patent: 5146482 (1992-09-01), Hoover
patent: 5356662 (1994-10-01), Early et al.
patent: 5461657 (1995-10-01), Hayashida et al.
patent: 5604782 (1997-02-01), Cash, Jr.
patent: 5911858 (1999-06-01), Ruffner

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