X-ray or gamma ray systems or devices – Specific application – Lithography
Patent
1992-12-22
1993-12-07
Church, Craig E.
X-ray or gamma ray systems or devices
Specific application
Lithography
378 85, G21K 500
Patent
active
052689514
ABSTRACT:
A x-ray scanning method involves the stops of directing an x-ray beam at a collimating first mirror having the capability of altering the source to mirror location and/or grazing angle of incidence. The beam is then reflected from a flat second mirror capable of a scanning motion by linear translation with an optional accompanying angular change in the grazing angle of incidence of the beam on the second mirror.
REFERENCES:
patent: 4803713 (1989-02-01), Fujii
patent: 4984259 (1991-01-01), Itow et al.
patent: 5031199 (1991-07-01), Cole et al.
patent: 5077774 (1991-12-01), Piestrup et al.
J. P. Silverman, et al., "Synchrotron radiation X-ray lithography: recent results" SPIE vol. 448, pp. 50-59, 1984.
R. P. Haelbich, "Optimization of the optics matching a storage ring to an X-ray lithography camera" SPIE vol. 448, pp. 93-101, 1984.
E. Cullmann, et al. "An X-ray stepper for production lithography" SPIE vol. 773, pp. 2-6, 1987.
Flamholz Alexander L.
Rippstein Robert P.
Silverman Jerome P.
Thompson Matthew A.
Church Craig E.
International Business Machines - Corporation
Jones II Graham S.
Peterson Jr. Charles W.
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