Writing atomic scale features with fine tip as source of deposit

Details Writing atomic scale features with fine tip as source of deposit Writing atomic scale features with fine tip as source of deposit

1990-04-05

1991-08-27

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Methods

250306, 2504922, 369101, H01J 3730

Patent

active

050435787

ABSTRACT:
Submicron structures are written on a surface by positioning in nanometer range proximity, preferably within current tunneling range, of the surface a scanning tip of a material that emits atoms upon application of an applied voltage of low magnitude. While the tip is maintained within said range, it is moved relative to the surface, and a series of short voltage pulses are concurrently applied between the tip and surface. These pulses cause atoms of tip material to directly transfer to the surface and concurrently cause remaining atoms of tip material to migrate to the tip and continuously reform the tip and maintain its sharp configuration, thereby insuring uninterrupted writing ability. Various tip materials exhibiting low field evaporation potentials may be used; however, gold is preferred if deposition is to be under ambient conditions. Heating the tip enhances the ability of the material to emit atoms. The deposited structures may be selectively sensed or erased by application of appropriate voltages.

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J. Schneir et al., Tunneling Microscopy, Lithography, and Surface Diffusion on an Easily Prepared, Atomically Flat Gold Surface, Journal of Applied Physics, vol. 63, No. 3, Feb. 1988, pp. 717-721.
Tsong, Field Ion Image Formation, Surface Science, vol. 70, 1978, pp. 211-213.

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