Work surface treatment method and work surface treatment apparat

Details Work surface treatment method and work surface treatment apparat Work surface treatment method and work surface treatment apparat

1998-01-05

2000-12-26

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

216 71, 438729, H01L 2100, H05H 100

Patent

active

061653764

ABSTRACT:
A work is supported by a work support electrode arranged in a vacuum container, a treatment gas corresponding to intended treatment of the work is supplied into the container, and a vacuum is produced in the container. Plasma is formed from the gas by applying an amplitude-modulated high-frequency power to an electrode electrically insulated from the work support electrode, said amplitude-modulated high-frequency power being prepared by effecting amplitude modulation on a basic high-frequency power having a predetermined frequency in a range from 10 MHz to 200 MHz with a modulation frequency in a range from 1/1000 to 1/10 of said predetermined frequency. A positive pulse voltage is applied to the work support electrode to effect the treatment on the surface of the work supported by the work support electrode.

REFERENCES:
patent: 4464223 (1984-08-01), Gorin
patent: 4764394 (1988-08-01), Conrad
patent: 4950377 (1990-08-01), Huebner
patent: 5212425 (1993-05-01), Goebel et al.
patent: 5698062 (1997-12-01), Sakamoto et al.
patent: 5928528 (1999-07-01), Kubota et al.
patent: 5997687 (1999-12-01), Koshimizu et al.

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