Wireless temperature calibration device and method

Thermal measuring and testing – Thermal calibration system

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2502521, 324158R, G01K 1500, G01D 1800

Patent

active

052659577

ABSTRACT:
A device and method for calibrating at least one temperature sensor is disclosed herein. A wafer (30) is provided having a first plurality of calibration islands (36) of a material having a melting point in the range 150.degree.-1150.degree. C. The effective reflectivity of the wafer is measured in operation using the temperature sensor or via a separate light source. A first step change in an output signal of the temperature sensor corresponding to a wafer temperature equal to the melting point of the first calibration islands is detected. Finally, the temperature sensor calibration parameters are calculated.

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Badgwell et al., "In situ Measurement of Wafer Temperatures in a Low Pressure Chemical Vapor Deposition Furnace", IEEE Transactions on Semiconductor Manufacturing, vol. 6, No. 1, Feb. 1993, pp. 65-71.

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