Thermal measuring and testing – Thermal calibration system – By thermal radiation emitting device
Patent
1993-09-01
1994-07-05
Yasich, Daniel M.
Thermal measuring and testing
Thermal calibration system
By thermal radiation emitting device
2502521, G01K 1500, G01J 554
Patent
active
053261704
ABSTRACT:
A method for calibrating at least one temperature sensor. A wafer (30) having calibration structures of a material having a melting point in the range of 150.degree. to 1150.degree. C. is provided. The temperature sensor is operable to detect a temperature dependent characteristic of the wafer and output a signal corresponding to the temperature depending characteristic. The power input is selectively varied and the wafer temperature is ramped for a calibration run. A wafer characteristic, such as wafer reflectance, radiance, or emissivity, is monitored. A first step change in the wafer characteristic corresponding to a wafer temperature equal to the melting point of the calibration structures is detected and a set of calibration parameters for each temperature sensor being calibrated is calculated.
REFERENCES:
patent: 4309901 (1982-01-01), Rolinski et al.
patent: 4623263 (1986-11-01), Barberi et al.
patent: 4627740 (1986-12-01), Jerde et al.
patent: 4761539 (1988-08-01), Carmean
patent: 4956538 (1990-09-01), Moslehi
patent: 4984902 (1991-01-01), Crowley et al.
patent: 5092674 (1992-03-01), Brotz
patent: 5102231 (1992-04-01), Loewenstein et al.
patent: 5156461 (1992-10-01), Moslehi et al.
patent: 5221142 (1993-06-01), Snow
patent: 5258602 (1993-11-01), Naselli et al.
patent: 5265957 (1993-11-01), Moslehi et al.
Dilhac et. al., "In situ interferometric measurements in a rapid thermal processor", SPIE vol. 1393 Rapid thermal and Related Processing Techniques (1990), pp. 349-353. (Oct. 2-3, 1990).
Badgwell et al., "In situ Measurement of Wafer Temperatures in a Low Pressure Chemical Vapor Deposition Furnace", IEEE Transactions on Semiconductor Manufacturing, vol. 6, No. 1, Feb. 1993, pp. 65-71.
J. M. Dilhac, C. Ganibal, N. Nolhier, and B. Rousset, "Ge Thin-film Melting Point Detection For Optical Pyrometer Calibration In A Rapid Thermal Processor", 8127 Review of Scientific Instruments 63(1992) Jan., No. 1, New York, US, pp. 188-190.
Moslehi Mehrdad M.
Najm Habib
Velo Lino A.
Donaldson Richard L.
Garner Jacqueline J.
Hiller William E.
Texas Instruments Incorporated
Yasich Daniel M.
LandOfFree
Wireless temperature calibration device and method does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Wireless temperature calibration device and method, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Wireless temperature calibration device and method will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-792771